; time=15 lt; min gt; N2_ramp name=n28 temperature=1000 lt; C gt; time=50 lt; min gt; N2 trate=- 3 lt; C/min gt; _ramp name=n28 temperature=850 lt; C gt; time=25 lt; min gt; N2 lasttemp.ramp=n28
# ( No 30 OXIDE REMOVING IN LOCOS ) oxide thickness=0.04 rate={1} etchstop.overetch=0.01
# (No 30 NITRIDE REMOVING ALL - 110 nm) nitride thickness=0.115 rate={1} etchstop.overetch=0.01
# (No 30 OXIDE REMOVING DO DOROZKI SKRAIBIROVANIA) oxide thickness=0.0425 rate={1} etchstop.overetch=0.01
# (No 32 oxidation 35 nm) _ramp name=n32 temperature=850 lt; C gt; time=40 lt; min gt; N2_ramp name=n32 temperature=850 lt; C gt; time=25 lt; min gt; N2 trate=4 lt; C/min gt; _ramp name=n32 temperature=950 lt; C gt; time=16 lt; min gt; N2_ramp name=n32 temperature=950 lt; C gt; time=10 lt; min gt; O2_ramp name=n32 temperature=950 lt; C gt; time=8 lt; min gt; gas.flow=O2_H2_ramp name=n32 temperature=950 lt; C gt; time=15 lt; min gt; N2_ramp name=n32 temperature=950 lt; C gt; time=35 lt; min gt; N2 trate=- 4.286 lt; C/min gt; _ramp name=n32 temperature=800 lt; C gt; time=25 lt; min gt; N2 lasttemp.ramp=n32
# (No 33 TRAVLENIE 35 nm) oxide thickness=0.035 rate={1} etchstop.overetch=0.02
# (No 34 Oxidation 50 nm UNDER GATE) _flow name=O2_0.1_N2_0.9 flowO2=0.1 flowN2=0.9_flow name=O2_0.5_H2_0.4 flowO2=0.5 flowH2=0.4_ramp name=n34 temperature=800 lt; C gt; time=30 lt; min gt; N2_ramp name=n34 temperature=800 lt; C gt; time=14 lt; min gt; trate=7.143 lt; C/min gt; gas_flow=O2_0.1_N2_0.9_ramp name=n34 temperature=900 lt; C gt; time=6 lt; min gt; gas_flow=O2_0.1_N2_0.9_ramp name=n34 temperature=900 lt; C gt; time=5 lt; min gt; O2_ramp name=n34 temperature=900 lt; C gt; time=22 lt; min gt; gas_flow=O2_0.5_H2_0.4_ramp name=n34 temperature=900 lt; C gt; time=10 lt; min gt; N2_ramp name=n34 temperature=900 lt; C gt; time=67 lt; min gt; N2 trate=- 1.493 lt; C/min gt; _ramp name=n34 temperature=800 lt; C gt; time=25 lt; min gt; N2 lasttemp.ramp=n34
# (No 35 DEPOSIT NITRIDE 65 nm) nitride thickness=0.065 type=isotropic
# (No 36 SI3N4 OXIDATION) _ramp name=n36 temperature=850 lt; C gt; time=40 lt; min gt; N2_ramp name=n36 temperature=850 lt; C gt; time=35 lt; min gt; N2 trate=4.286 lt; C/min gt; _ramp name=n36 temperature=1000 lt; C gt; time=16 lt; min gt; N2_ramp name=n36 temperature=1000 lt; C gt; time=10 lt; min gt; N2_ramp name=n36 temperature=1000 lt; C gt; time=50 lt; min gt; N2_ramp name=n36 temperature=1000 lt; C gt; time=15 lt; min gt; N2_ramp name=n36 temperature=1000 lt; C gt; time=50 lt; min gt; N2 trate=- 4 lt; C/min gt; _ramp name=n36 temperature=800 lt; C gt; time=25 lt; min gt; N2 lasttemp.ramp=n36
# (Arsenicum IMPLANT) Arsenic energy=380 dose=1.25e12
# (diffusion 7) _ramp name=n_impl temperature=850 lt; C gt; time=25 lt; min gt; N2_ramp name=n_impl temperature=850 lt; C gt; time=15 lt; min gt; N2_ramp name=n_impl temperature=850 lt; C gt; time=35 lt; min gt; N2 trate=4.286 lt; C/min gt; _ramp name=n_impl temperature=1000 lt; C gt; time=420 lt; min gt; N2_ramp name=n_impl temperature=1000 lt; C gt; time=50 lt; min gt; N2 trate=- 4 lt; C/min gt; _ramp name=n_impl temperature=800 lt; C gt; time=25 lt; min gt; N2 lasttemp.ramp=n_impl
# (No 40 SI3N4 OXIDATION) temp.ramp=n36
# (No 41 1-nd POLYSILICON DEPOSITION (0.5-0.6 mkm) poly thickness=0.55
# element=P concentration=1e20
# (No 43 DIFFUSIA FOSFORA - TEMPERATURES) _ramp name=n_41 temperature=900 lt; C gt; time=90 lt; min gt; N2temp.ramp=n_41_ramp name=n_43 temperature=850 lt; C gt; time=101 lt; min gt; N2_ramp name=n_43 temperature=850 lt; C gt; time=15 lt; min gt; N2 trate=- 3.333 lt; C/min gt; _ramp name=n_43 temperature=800 lt; C gt; time=25 lt; min gt; N2 lasttemp.ramp=n_43
# (No 49 1-GO POLY-Si OXIDATION) _ramp name=n49 temperature=850 lt; C gt; time=40 lt; min gt; N2_ramp name=n49 temperature=850 lt; C gt; time=35 lt; min gt; N2 trate=4.286 lt; C/min gt; _ramp name=n49 temperature=1000 lt; C gt; time=16 lt; min gt; N2_ramp name=n49 temperature=1000 lt; C gt; time=10 lt; min gt; N2_ramp name=n49 temperature=1000 lt; C gt; time=16 lt; min gt; N2_ramp name=n49 temperature=1000 lt; C gt; time=15 lt; min gt; N2_ramp name=n49 temperature=1000 lt; C gt; time=50 lt; min gt; N2 trate=- 4 lt; C/min gt; _ramp name=n49 temperature=800 lt; C gt; time=25 lt; min gt; N2 lasttemp.ramp=n49
# (No 53 O...
